Sharp achieves 25% efficiency of crystalline silicon solar cells
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Sharp announced that it will increase the unit conversion efficiency of crystalline silicon solar cells to 25.1%. This figure is second only to Matsushita's 25.6% released on April 10, 2014.
Regarding the cell conversion efficiency of crystalline silicon solar cells, the 25.0% set by the University of New South Wales (UNSW) in March 1999 was the highest value for a long period of time. This time, Panasonic and Sharp exceeded 25% at the same time.
Like Panasonic, Sharp also uses a combination of a "heterojunction" that forms an amorphous silicon layer on a silicon substrate and a "back contact structure" that forms an electrode only on the back side. While the carrier recombination on the surface of the silicon substrate is suppressed by the function of the amorphous silicon layer, the electrode on the light receiving surface is removed, and the light incident on the cell is increased. In addition, as of now, neither Sharp nor Panasonic have defined the production time of the tectonic unit.
Sharp has applied back contact structures to products. The research results of the use of heterojunctions in the back contact structure were first disclosed at the domestic exhibition in Japan in December 2012. The unit conversion efficiency at that time was 21.7%. It increased to 22.3% in February 2013, increased to 24.2% in July 2013, reached 24.7% in October 2013, reached 24.9% in February 2014, and reached 25.1% in April 2014.
The unit short circuit current density of 25.1% conversion efficiency was 41.7 mA/cm2, the open circuit voltage was 736 mV, the fill factor was 81.9%, and the area of ​​the measurement part was 3.72 cm2. The measurement work was performed by the Japan Institute of Electrical and Safety Environment (JET).
In addition, the results of this study are part of a project commissioned by the Japanese New Energy Industry Technology Development Agency (NEDO), “Research and Development of Ultimate Silicon Crystal Solar Cells,†and jointly implemented with Toyota University of Technology.
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